Kelvin Probe Force Microscopy on Semiconductors
Co-hosted by
Featuring Dr. Sascha Sadewasser
Division of Solar Energy, Hahn-Meitner
Hosted by Regina Ragan
Assistant Professor, Chemical Engineering and Materials Science
Location: 1114 Natural Sciences I
Open and free to the public
To improve understanding of semiconductor materials and device functionality, detailed studies are required to provide information on materials characteristics on the nanometer scale. Kelvin probe force microscopy (KPFM) is a technique based on non-contact atomic force microscopy (NC-AFM) and is well suited for this task, as it measures the surface potential with high spatial resolution. We apply a resonance enhanced mode of operation that allows compensating electrostatic forces using detection ac-voltages below 100 mV; thus, the influence of the KPFM tip on the semiconductor is minimized [1].
This talk will first introduce the KPFM method. It will then be demonstrated that for correct height imaging, the KPFM method is superior to regular NC-AFM. Depending on the sample bias, even a contrast inversion can be observed in regular NC-AFM topography imaging [2]. Using KPFM, a variation in the surface potential at surface steps of III-V semiconductors is observed. In conjunction with simulations, the density of charged defects was quantitatively determined, corresponding to about 2% of the dangling bonds being charged [3]. For the application to chalcopyrite semiconductors (i.e. Cu(In, Ga)Se2) in thin film solar cells, it is shown that differently oriented facets of single semiconductor grains show a distinct work function [4]. The investigation of grain boundaries in these polycrystalline thin films shows a local band bending due to the presence of charges [5]. However, for an epitaxially grown Σ3 grain boundary, a charge neutral barrier to majority transport could be identified for CuGaSe2 [6].
[1] Ch. Sommerhalter et al., Appl. Phys. Lett. 75, 286 (1999).
[2] S. Sadewasser et al., Phys. Rev. Lett. 91, 266101 (2003).
[3] Y. Rosenwaks et al., Phys. Rev. B 70, 085320 (2004).
[4] S. Sadewasser et al., Appl. Phys. Lett. 80, 2979 (2002).
[5] D. Fuertes Marrón et al., Phys. Rev. B 71, 033306 (2005).
[6] S. Siebentritt et al., Phys. Rev. Lett. 97, 146601 (2006).